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Ed Bujak: DSCN0445.Photolithography.Roland Ratnum, Dave Johnson (presenter)
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Ed Bujak: DSCN0446.Photolithography.Tony Fleury, Kurt Woolslayer, Roland Ratnum, Dave Johnson (presenter)
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Ed Bujak: DSCN0447.Photolithography.Lynete Luke, Mamadou Kane, Tony Fleury, Kurt Woolslayer
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Ed Bujak: DSCN0450.Photolithography
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Ed Bujak: DSCN0451.Photolithography
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Ed Bujak: DSCN0453.Photolithography.Dave Johnson (presenter), Lynette Luke, Roland Ratnum
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Ed Bujak: DSCN0454.Photolithography
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Ed Bujak: DSCN0456.Photolithography
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Ed Bujak: DSCN0457.Photolithography.Group 2-Lynette Luke, Kurt Woolslayer, Mamadou Kane, Roland Ratnum
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Ed Bujak: DSCN0459.Photolithography.Dave Johnson (presenter)
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Ed Bujak: DSCN0460.Photolithography.cleaning wafer surface (in spinner) with HMDS
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Ed Bujak: DSCN0462.Photolithography.cleaning wafer surface (in spinner) with HMDS
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Ed Bujak: DSCN0463.Photolithography.spinner with loaded wafer
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Ed Bujak: DSCN0464.Photolithography.spinner
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Ed Bujak: DSCN0465.Photolithography.removing wafer from spinner
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Ed Bujak: DSCN0466.Photolithography.placing wafer on hotplate to burn off liquid
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Ed Bujak: DSCN0467.Photolithography.removing wafer from hotplate
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Ed Bujak: DSCN0469.Photolithography.applying photoresist to wafer surface
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Ed Bujak: DSCN0471.Photolithography.photoresist is spun off of wafer
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Ed Bujak: DSCN0472.Photolithography.placing wafer on hotplate to heat photresist and level it
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Ed Bujak: DSCN0475.Photolithography.after wafer has been exposed to UV (not shown) then the photoresist is developed
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Ed Bujak: DSCN0476.Photolithography.developing photoresist
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Ed Bujak: DSCN0477.Photolithography.developing photoresist
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Ed Bujak: DSCN0478.Photolithography.developing photoresist
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Ed Bujak: DSCN0479.Photolithography.developing photoresist
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Ed Bujak: DSCN0480.Photolithography.developing photoresist
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Ed Bujak: DSCN0481.Photolithography.developing photoresist
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Ed Bujak: DSCN0482.Photolithography.developing photoresist
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Ed Bujak: DSCN0485.Photolithography.developing photoresist
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Ed Bujak: DSCN0486.Photolithography.developing photoresist